TMPS can also be used in the preparation of polytrimethoxyphenylsilane (PTMS) that facilitates the removal of graphene after chemical vapor deposition (CVD). Molecularly imprinted sol gels can be synthesized by using TMPS for the fabrication of localized surface plasmon resonance (LSPR).
Trimethoxyphenylsilane is an alkyltrimethoxysilane that can used as a silane based filming agent. It can be used as a precursor material and a silanization agent in the preparation of mesoporous silica with phenyl groups.
1 L in Sure/Seal™